Market Size in 2022 | Market Forecast in 2030 | CAGR (in %) | Base Year |
---|---|---|---|
USD 23.11 billion | USD 41.67 billion | 7.65% | 2022 |
The CVD Equipment Market manufactures, distributes, and sells CVD equipment. The semiconductor, electronics, and materials sectors use CVD to create thin films on surfaces.The global chemical vapor deposition (CVD) equipment market size was worth around USD 23.11 billion in 2022 and is predicted to grow to around USD 41.67 billion by 2030 with a compound annual growth rate (CAGR) of roughly 7.65% between 2023 and 2030.
The report analyzes the global chemical vapour deposition (CVD) equipment market drivers, restraints/challenges, and the effect they have on the demands during the projection period. In addition, the report explores emerging opportunities in the chemical vapor deposition (CVD) equipment industry.
Chemical vapor deposition (CVD) equipment is a manufacturing device used during the process of chemical vapor deposition. In this process, thin films of various materials are deposited on solid substrates, such as silicon wafers. This assists in creating functional layers or coatings that provide specific properties. The equipment consists of a reactor or a chamber where the process of deposition takes place. The design of the device allows the creation of a controlled environment that has precise conditions allowing thin film deposition. CVD equipment can be customized depending on the final requirements. This helps in optimizing the process for specific materials and applications. CVD equipment is used in various industries such as semiconductor manufacturing, solar cells, optical coatings, and thin-film electronics. The choice of the process and the equipment depends entirely on desired film characteristics along with substrate material, and specific application requirements.
Increasing application in semiconductor industry to propel market demand
The global chemical vapor deposition (CVD) equipment market is projected to grow owing to the increasing application of the equipment in one of the fastest-growing and valuable sectors which is the semiconductor industry. There are several applications of CVD equipment in this sector. For instance, it is used in the deposition of thin film on semiconductor substrates. This includes materials such as silicon dioxide (SiO2), silicon nitride (Si3N4), and various metal films. They are important for the fabrication of transistor gates, interconnects, dielectric layers, and other components of integrated circuits (ICs). Moreover, the application of CVD equipment in the Epitaxial growth process has allowed more demand in the industry. In this process, a single-crystal layer is deposited on a silicon wafer. Other processes such as Low-Pressure Chemical Vapor Deposition (LPCVD) and Diffusion Barrier Deposition have also led to higher use of the device.
High initial investment to restrict market expansion
CVD equipment requires high initial investment due to the complex design of the machine. It is made of specialized components and has sophisticated control designs. Moreover, if the machine has to be customized depending on the user’s needs, the cost may go up even higher. This has led to restricted growth in the global chemical vapor deposition equipment industry especially in small and medium-sized end-user companies. Additionally, there is a growing segment of consumers showing an inclination toward other alternative methods such as physical vapor deposition (PVD) and atomic layer deposition (ALD).
Emerging use in nanotechnology to provide growth opportunities
The global chemical vapor deposition equipment industry can expect several growth opportunities owing to the increasing application of CVD equipment in nanotechnology which is fast gaining momentum in the science field. Nanotechnology applications are growing in various fields such as electronics, healthcare, energy, and materials science. CVD equipment is likely to play a crucial role in fabricating nanoscale structures and thin films with precise measurements.
Technological complexity to challenge the market expansion
The global sales volume of the chemical vapor deposition equipment market may be limited due to the high complexity associated with the technology since CVD processes involve complex chemical reactions and physical phenomena. It requires a deep understanding of materials science, deposition techniques, and process optimization. The development and maintenance of expertise in CVD technology can be a challenge due to the availability of a limited workforce.
The global chemical vapor deposition (CVD) equipment market is segmented based on technology, application, and region.
Based on technology, the global market segments are plasma-assisted and thermal. The industry witnessed the highest growth in the plasma-assisted segment in 2022. The technology is also known as plasma-enhanced CVD (PECVD) and it involves the use of plasma to optimize CVD processes. Plasma is created by energizing a gas using an electrical discharge. It leads to the formation of reactive species that assist in the deposition of thin films. The technology offers several benefits such as lower deposition temperatures, improved film quality, enhanced step coverage, and the ability to deposit a wide range of materials. Thermal CVD is also known as traditional CVD or LPCVD and relies on high temperatures to start and drive the chemical reactions for deposition. The temperature range in this process lies between 500°C to 1200°C.
Based on application, the chemical vapor deposition equipment is divided into cutting tools, electronics, solar panels, medical devices, and others. The highest growth was observed in the electronic segment where the equipment is crucial for the fabrication of several forms of electronic components and semiconductor devices. The industry relies heavily on CVD equipment for important processes such as deposition, diffusion, epitaxy, and etching. Some of the advantages of using the technology include ensuring uniformity, conformality, and precise control of film properties. It is also used in the production of display panels, LED (light-emitting diode) devices, and other electronic components. A result survey concluded that an average American has access to around 10 connected devices in their household.
Report Attributes | Report Details |
---|---|
Report Name | Chemical Vapour Deposition (CVD) Equipment Market Research Report |
Market Size in 2022 | USD 23.11 Billion |
Market Forecast in 2030 | USD 41.67 Billion |
Growth Rate | CAGR of 7.65% |
Number of Pages | 214 |
Key Companies Covered | Applied Materials Inc., ASM International N.V., Lam Research Corporation, Tokyo Electron Limited, Veeco Instruments Inc., AIXTRON SE, CVD Equipment Corporation, ULVAC Technologies Inc., Plasma-Therm LLC, SENTECH Instruments GmbH, SPTS Technologies (an Orbotech company), Oxford Instruments plc, Centrotherm AG, Canon Anelva Corporation, Semicore Equipment, Inc., Picosun Group, LPE S.p.A., Ningbo Deyi High-Technology Development Co., Ltd., Denton Vacuum LLC, Mustang Vacuum Systems, Soleras Advanced Coatings, EVATEC AG, Hauzer Techno Coating, and Angstrom Engineering Inc. |
Segments Covered | By Technology, By Application, and By Region |
Regions Covered | North America, Europe, Asia Pacific (APAC), Latin America, Middle East, and Africa (MEA) |
Base Year | 2022 |
Historical Year | 2017 to 2021 |
Forecast Year | 2023 - 2030 |
Customization Scope | Avail customized purchase options to meet your exact research needs. Request For Customization |
Asia-Pacific to continue its dominance
The global chemical vapour deposition (CVD) equipment market is expected to witness the highest growth in Asia-Pacific during the forecast period. The region has already dominated the industry in the last few years. The high growth rate is mainly driven by the presence of a well-established semiconductor industry in countries such as Taiwan, China, India, and Japan. One of the largest suppliers of semiconductors to the global electronics market is Taiwan. As indicated by The Register, the country controlled over 61% of the world's capacity to produce chips that are under 16 nm process nodes.
Furthermore, the region is witnessing intensive research on developing more efficient and advanced CVD equipment to keep up with changing demand and requirements in the commercial market. The presence of key players and growing end-verticals applications, such as in the electric vehicle and electronics segment is also crucial to the regional expansion. The region emphasizes innovation and technological advancements which could lead to higher growth.
The global chemical vapour deposition (CVD) equipment market is led by players like:
By Technology
By Application
FrequentlyAsked Questions
Chemical vapor deposition (CVD) equipment is a manufacturing device used during the process of chemical vapour deposition. In this process, thin films of various materials are deposited on solid substrates, such as silicon wafers.
The global chemical vapor deposition (CVD) equipment market is projected to grow owing to the increasing application of the equipment in one of the fastest-growing and valuable sectors which is the semiconductor industry.
According to study, the global chemical vapor deposition (CVD) equipment market size was worth around USD 23.11 billion in 2022 and is predicted to grow to around USD 41.67 billion by 2030 billion by 2030.
The CAGR value of the chemical vapor deposition (CVD) equipment market is expected to be around 7.65% during 2023-2030.
The global chemical vapour deposition (CVD) equipment market is expected to witness the highest growth in Asia-Pacific during the forecast period.
The global chemical vapor deposition (CVD) equipment market is led by players like Applied Materials Inc., ASM International N.V., Lam Research Corporation, Tokyo Electron Limited, Veeco Instruments Inc., AIXTRON SE, CVD Equipment Corporation, ULVAC Technologies Inc., Plasma-Therm LLC, SENTECH Instruments GmbH, SPTS Technologies (an Orbotech company), Oxford Instruments plc, Centrotherm AG, Canon Anelva Corporation, Semicore Equipment, Inc., Picosun Group, LPE S.p.A., Ningbo Deyi High-Technology Development Co., Ltd., Denton Vacuum LLC, Mustang Vacuum Systems, Soleras Advanced Coatings, EVATEC AG, Hauzer Techno Coating, and Angstrom Engineering Inc.
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