Market Size in 2022 | Market Forecast in 2030 | CAGR (in %) | Base Year |
---|---|---|---|
USD 23.11 billion | USD 41.67 billion | 7.65% | 2022 |
FrequentlyAsked Questions
Chemical vapor deposition (CVD) equipment is a manufacturing device used during the process of chemical vapour deposition. In this process, thin films of various materials are deposited on solid substrates, such as silicon wafers.
The global chemical vapor deposition (CVD) equipment market is projected to grow owing to the increasing application of the equipment in one of the fastest-growing and valuable sectors which is the semiconductor industry.
According to study, the global chemical vapor deposition (CVD) equipment market size was worth around USD 23.11 billion in 2022 and is predicted to grow to around USD 41.67 billion by 2030 billion by 2030.
The CAGR value of the chemical vapor deposition (CVD) equipment market is expected to be around 7.65% during 2023-2030.
The global chemical vapour deposition (CVD) equipment market is expected to witness the highest growth in Asia-Pacific during the forecast period.
The global chemical vapor deposition (CVD) equipment market is led by players like Applied Materials Inc., ASM International N.V., Lam Research Corporation, Tokyo Electron Limited, Veeco Instruments Inc., AIXTRON SE, CVD Equipment Corporation, ULVAC Technologies Inc., Plasma-Therm LLC, SENTECH Instruments GmbH, SPTS Technologies (an Orbotech company), Oxford Instruments plc, Centrotherm AG, Canon Anelva Corporation, Semicore Equipment, Inc., Picosun Group, LPE S.p.A., Ningbo Deyi High-Technology Development Co., Ltd., Denton Vacuum LLC, Mustang Vacuum Systems, Soleras Advanced Coatings, EVATEC AG, Hauzer Techno Coating, and Angstrom Engineering Inc.
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